Syracuse, UT, United States of America

Craig J Wallace

This inventor holds 2 USPTO granted patents. Top assignee: Nse Products, Inc.. Active years: 2025-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Craig J Wallace. Retrieved from https://idiyas.com/inventor/craig-j-wallace

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 3.7

ph-index = 1


Company Filing History:


Years Active: 2025-2026

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2 patents (USPTO):Explore Patents

Title: Craig J Wallace: Innovator in Skin Treatment Technology

Introduction

Craig J Wallace is a notable inventor based in Syracuse, UT (US). He has made significant contributions to the field of skin treatment technology. His innovative approach has led to the development of a unique device that enhances skin treatment procedures.

Latest Patents

Wallace holds a patent for a "Current control system for skin treatment device." This device features one or more electrodes designed for the application of a current to the skin surface of a subject. It includes a voltage or current supply that generates the current, along with a controller that modulates the power output to the skin surface. The controller is equipped with a monitor circuit that provides feedback based on changes in power output, and a control circuit that adjusts the current accordingly.

Career Highlights

Craig J Wallace is associated with Nse Products, Inc., where he continues to innovate and develop new technologies. His work has garnered attention for its potential to improve skin treatment outcomes.

Collaborations

Some of his coworkers include Ductoan T Doan and Dale G Kern, who contribute to the collaborative environment at Nse Products, Inc.

Conclusion

Craig J Wallace's contributions to skin treatment technology exemplify the impact of innovation in healthcare. His patent reflects a commitment to improving patient care through advanced technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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