Portland, OR, United States of America

Cornelius Alexander Van Der Jengd


Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 75(Granted Patents)


Company Filing History:


Years Active: 2001

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1 patent (USPTO):

Title: The Innovative Mind of Cornelius Alexander Van Der Jengd

Introduction

Cornelius Alexander Van Der Jengd, based in Portland, OR, is an inventive force in the realm of semiconductor manufacturing. With a robust understanding of material science and engineering, he has contributed significantly to the field through his innovative patent that addresses key challenges in silicon deposition.

Latest Patents

Van Der Jengd holds a patent for a method of depositing silicon with high step coverage. This method enables the deposition of silicon at high rates and excellent step coverage by performing the process at high pressures, close to atmospheric levels, and at temperatures exceeding 650°C. The technique involves flowing silane and hydrogen over a substrate in a single-wafer chamber. Notably, this method achieves deposition rates greater than 50 nm/min, even with the addition of dopant gases. This versatility allows for effective filling of deep trenches and vias with high aspect ratios, up to 40:1, without the occurrence of voids or keyholes.

Career Highlights

Cornelius is currently affiliated with ASML America, Inc., a leading company in the semiconductor industry. His groundbreaking work in silicon deposition techniques has been pivotal in advancing manufacturing capabilities and ensuring efficient production processes. His innovative approach is recognized for improving the quality and reliability of semiconductor devices.

Collaborations

Throughout his career, Van Der Jengd has worked alongside talented professionals such as Ivo Johannes Raaijmakers and Christopher François Lilian Pomarède. These collaborations have undoubtedly enriched his work and expanded the impact of his contributions to the semiconductor field.

Conclusion

Cornelius Alexander Van Der Jengd exemplifies the spirit of innovation in semiconductor technology. His patent for a method of depositing silicon demonstrates his commitment to solving complex engineering challenges. As the industry continues to evolve, inventions like his will play a crucial role in advancing technology and enhancing the capabilities of modern devices.

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