Company Filing History:
1 out of 9 
1 out of 10 Years Active: 2005-2006
Title: Cormac Walsh: Innovator in Chemical Mechanical Polishing Technology
Introduction
Cormac Walsh is a notable inventor based in Sunnyvale, CA. He has made significant contributions to the field of chemical mechanical polishing (CMP) technology. With a total of 2 patents, his work focuses on improving the efficiency and effectiveness of polishing apparatuses.
Latest Patents
Walsh's latest patents include innovative solutions for CMP processes. The first patent, titled "Apparatus and method for removing a CMP polishing pad from a platen," provides a method that enhances the removal of polishing pads from platens. This invention aims to streamline the pad removal process, making it more efficient. The second patent, "Slurry distributor for chemical mechanical polishing apparatus and method of using the same," describes a polishing apparatus designed to improve planarization uniformity. This apparatus features a platen with a polishing surface, a head to hold the substrate, and a mechanism to rotate the platen during polishing. Additionally, it includes a slurry dispenser with nozzles to dispense slurry and a distributor to enhance the polishing process. The design also incorporates a wiper to remove used slurry and polishing byproducts, thereby improving yield and reducing potential damage to the substrate.
Career Highlights
Throughout his career, Cormac Walsh has worked with several companies, including Multiplanar Technologies Incorporated and Ebara Technologies Incorporated. His experience in these organizations has contributed to his expertise in CMP technology and innovation.
Collaborations
Walsh has collaborated with notable colleagues such as Gerard Moloney and Jun Liu. These partnerships have likely fostered a creative environment that encourages innovation and the development of new technologies.
Conclusion
Cormac Walsh's contributions to the field of chemical mechanical polishing technology are significant. His patents reflect a commitment to improving the efficiency of polishing processes, showcasing his innovative spirit. His work continues to influence the industry and pave the way for future advancements.