Coriolan I Frum

Title: Coriolan I Frum: Innovator in Substrate Etching Technology

Introduction

Coriolan I Frum is a notable inventor based in Los Gatos, CA. He has made significant contributions to the field of substrate etching, holding a total of 3 patents. His innovative approaches have advanced the technology used in various industrial applications.

Latest Patents

Frum's latest patents include groundbreaking methods for improving substrate etching processes. One of his patents, titled "Interferometric endpoint detection in a substrate etching process," describes a method that involves placing a substrate in a process zone and using an etchant gas to etch the material. The endpoint of the etching process is determined by reflecting a light beam from the substrate, which is selected to have a specific wavelength that optimizes the detection of the etching endpoint.

Another significant patent is "Monitoring substrate processing with optical emission and polarized reflected radiation." This patent outlines a method for monitoring the etching process by detecting the intensities of radiation emissions generated by the energized gas and evaluating the signals to determine the completion of the etching stages.

Career Highlights

Coriolan I Frum has worked with prominent companies in the semiconductor industry, including Applied Materials, Inc. and Varian, Inc. His experience in these organizations has allowed him to develop and refine his innovative techniques in substrate processing.

Collaborations

Throughout his career, Frum has collaborated with talented individuals such as Zhifeng Sui and Jie Yuan. These partnerships have contributed to the advancement of his research and the successful development of his patented technologies.

Conclusion

Coriolan I Frum's contributions to substrate etching technology demonstrate his expertise and innovative spirit. His patents reflect a commitment to enhancing industrial processes, making him a significant figure in the field of semiconductor manufacturing.