Congjun Wu

Title: Congjun Wu: Innovator in Semiconductor Measurement Technology

Introduction

Congjun Wu is a prominent inventor based in Sichuan, China, known for his contributions to semiconductor measurement technology. With a total of two patents to his name, he has made significant advancements in the field of nitride epitaxial growth.

Latest Patents

One of his latest patents is titled "Device and method for measuring film longitudinal temperature field during nitride epitaxial growth." This invention focuses on designing a measurement scheme for the longitudinal temperature of the film during the nitride epitaxial growth process. It addresses the limitations of traditional non-contact temperature measurement methods, which typically measure the temperature of the graphite disk but fail to capture the longitudinal temperature. By employing ultraviolet and infrared radiation temperature measurement technologies, this invention allows for a more accurate assessment of temperature variations, thereby enhancing the performance of semiconductor devices.

Another notable patent is the "Real-time monitoring microscopic imaging system for nitride MOCVD epitaxial growth mode." This system includes an observation window, imaging lens set, CCD camera, image capture card, and image storage and display device. It is designed to provide real-time monitoring of the growth mode of MOCVD epitaxial wafers, distinguishing between 2D and 3D growth modes. The system's high resolution, better than 1 µm, enables the observation of screw dislocations on the surface of the epitaxial wafer during the growth process.

Career Highlights

Congjun Wu is affiliated with the University of Electronic Science and Technology of China, where he continues to contribute to research and innovation in semiconductor technologies. His work has been instrumental in advancing the understanding and application of nitride materials in various electronic devices.

Collaborations

He has collaborated with notable colleagues, including Chao Wang and Ying Duan, to further enhance the research and development efforts in their field.

Conclusion

Congjun Wu's innovative patents and contributions to semiconductor measurement technology highlight his role as a key figure in advancing nitride epitaxial growth methods. His work not only improves the understanding of temperature regulation during growth processes but also enhances the overall performance of semiconductor devices.