Halifax, Canada

Colin Ragush

This inventor holds 2 USPTO granted patents and 1 published patent application and 1 EPO patent. Top assignee: Sentry:water Monitoring and Control Inc.. Active years: 2023-2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Colin Ragush. Retrieved from https://idiyas.com/inventor/colin-ragush

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 2 

% Patents Active = 100.0

 

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2023-2025

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2 patents (USPTO):Explore Patents

Title: Colin Ragush: Innovator in Water Monitoring and Control

Introduction

Colin Ragush is an inventor based in Halifax, Canada. He is known for his work in the field of water monitoring and control. Currently, he is associated with Sentry Water Monitoring and Control Inc. Despite having no patents to his name, his contributions to the industry are noteworthy.

Latest Patents

Colin Ragush currently holds 2 patents. This indicates that he may be in the early stages of his innovative journey or focusing on collaborative projects rather than individual patenting.

Career Highlights

Colin has made significant strides in his career at Sentry Water Monitoring and Control Inc. His role involves developing solutions that enhance water management systems. His expertise is crucial in addressing the challenges related to water quality and conservation.

Collaborations

Colin works alongside talented individuals such as Jack Ambler and Patrick Desmond Kiely. Their combined efforts contribute to the innovative environment at Sentry Water Monitoring and Control Inc.

Conclusion

Colin Ragush is an emerging figure in the water monitoring industry, dedicated to improving water management practices. His work, although not yet reflected in patents, showcases his commitment to innovation and collaboration.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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