Moissy Cramayel, France

Clément Rolland

This inventor holds 1 USPTO granted patent and 2 published patent applications and 2 EPO patents. Top assignee: Safran Nacelles. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Clément Rolland. Retrieved from https://idiyas.com/inventor/clément-rolland-2ynt5oz5

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 1 

 

Average Co-Inventor Count = 1.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Clément Rolland - Innovator in Gripping Technology

Introduction

Clément Rolland is an inventor based in Moissy Cramayel, France. He is currently employed at Safran Nacelles, where he contributes to advancements in gripping technology. Although he does not hold any granted patents, his work is focused on innovative solutions in his field.

Latest Patent Applications

Clément Rolland has submitted several notable patent applications. One of his latest applications is titled "Gripping Head, in Particular for Applying a Patch to a Surface to be Draped." This gripping head is designed for applying a patch to a surface and includes a suction chamber that defines a suction sector, connected to a suction intake. The gripper, made of elastically deformable material, is configured to grip a patch through a gripping effect created in the suction chamber. The gripping head also features selectively activatable gripping zones and means for activating these zones.

Another significant application is "Method and System for Controlling the Application of a Patch." This method outlines steps for effectively controlling the application of a patch, showcasing Clément's innovative approach to problem-solving in his field.

Conclusion

Clément Rolland is a dedicated inventor whose work at Safran Nacelles focuses on developing advanced gripping technologies. His latest patent applications reflect his commitment to innovation and improvement in the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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