Annapolis, MD, United States of America

Clyde A Morehead

This inventor holds 3 USPTO granted patents. Top assignee: USA as Represented by Secretary of the Navy. Active years: 1996-2000.


% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 3

Forward Citations = 75(Granted Patents)


Company Filing History:


Years Active: 1996-2000

Loading Chart...
3 patents (USPTO):Explore Patents

Title: Clyde A. Morehead: Innovator in Muffler Technology

Introduction

Clyde A. Morehead is a notable inventor based in Annapolis, MD (US), recognized for his contributions to muffler technology. With a total of 3 patents, Morehead has developed innovative solutions aimed at improving gas flow in machines.

Latest Patents

Morehead's latest patents include the "Venturi muffler having plural nozzles" and the "Venturi muffler with variable throat area." The first invention focuses on a muffler designed for gas flow at a machine's gas intake. It features at least one venturi nozzle with an inlet opening, an outlet opening, and a throat in between. This design allows for the variation of the total effective throat area of the muffler, enhancing its performance. The second patent also centers on a muffler for gas flow, incorporating a chamber that connects to the venturi nozzle. This invention allows for the variation of both the total throat area and the volume enclosed by the chamber, providing further adaptability in muffler design.

Career Highlights

Clyde A. Morehead works for the United States as represented by the Secretary of the Navy. His role involves applying his innovative ideas to enhance the efficiency and functionality of machinery used in various applications.

Collaborations

Morehead collaborates with John W. Henry, IV, contributing to advancements in muffler technology and related fields.

Conclusion

Clyde A. Morehead's work in muffler technology showcases his innovative spirit and dedication to improving machine efficiency. His patents reflect a commitment to advancing engineering solutions in the field.

Profile summary based on public USPTO records.
Please report any incorrect information to [email protected]
Loading…