Clint Wu

Title: Clint Wu: Innovator in Semiconductor Technology

Introduction

Clint Wu is a notable inventor based in Tai Chung, Taiwan, recognized for his significant contributions to the semiconductor industry. With a portfolio that includes two patents, Clint has focused on developing advanced processes for fabricating contact plugs that enhance the performance and reliability of integrated circuits.

Latest Patents

Clint Wu's latest patents detail innovative methodologies for creating contact plugs essential in semiconductor IC devices. The first patent, titled "Process for making contact plug," describes a sophisticated process where an insulating layer is formed over an IC substrate. This layer is then patterned to create contact vias, revealing the conductive regions necessary for electrical connections. To ensure the integrity of these connections, a glue layer is deposited and subsequently densified through rapid thermal annealing or plasma treatment, preventing void formation within the contact plugs. The process concludes with polishing the device substrate to expose the insulating layer and achieve a planar surface for the contact plug.

The second patent, "Method of fabricating a conductive plug," outlines a method for forming a conductive plug on a semiconductor substrate. This involves creating an insulating layer over the substrate, etching it to form a contact window, and applying a diffusion barrier layer. A hydrogen plasma treatment is utilized, followed by filling the contact window with conductive material to establish the conductive plug. This innovation plays a crucial role in improving electrical connectivity within semiconductor devices.

Career Highlights

Clint Wu is currently associated with United Microelectronics Corporation, where he leverages his expertise in semiconductor technology. His work has significantly contributed to enhancing manufacturing processes that drive efficiency and effectiveness in semiconductor production. His patented methods reflect his commitment to innovation and excellence in the field.

Collaborations

During his career, Clint has had the opportunity to collaborate with esteemed colleagues, including Horng-Bor Lu and Jenn-Tarng Lin. These collaborations have fostered a dynamic exchange of ideas, further advancing the technology within their field.

Conclusion

Clint Wu exemplifies the innovative spirit of today's semiconductor industry. With his advanced patents and contributions, he has paved the way for the next generation of semiconductor technologies. His dedication to improving manufacturing processes not only enhances the performance of semiconductor devices but also underscores the importance of innovation in driving industry progress.