This inventor holds 1 USPTO granted patent. Top assignee: Ethyl Corporation. Active years: 1990.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 1990
Title: **Clifford S. Durand, III: A Pioneer in Gas Detection Technology**
Introduction
Clifford S. Durand, III is an innovative inventor based in Baton Rouge, LA, who has made significant contributions to the field of gas detection technology. With a keen focus on safety and performance, his invention has the potential to enhance processes in various industries requiring precise gas monitoring.
Latest Patents
Durand holds one patent for his groundbreaking invention titled "Rupture Disc Monitor." This patent describes an apparatus and process designed for detecting gas permeability in a main rupture disc that is in gaseous communication with a vessel. The patented process involves fitting a chamber over the rupture disc to maintain a gas-tight association, selecting appropriate burst and set pressures, and monitoring pressure changes within the chamber to ensure system integrity.
Career Highlights
Clifford S. Durand, III has dedicated his professional career to innovating safety mechanisms that are critical for industrial operations. Currently, he is associated with Ethyl Corporation, where he continues to develop technologies that promote efficiency and reliability in gas management systems.
Collaborations
During his tenure at Ethyl Corporation, Durand has collaborated with fellow innovator Phillip R. Beaver. Their teamwork exemplifies the collaborative spirit of innovation, where shared expertise leads to the development of advanced solutions in the field.
Conclusion
Clifford S. Durand, III stands out as a notable inventor in the realm of gas detection technologies. His commitment to safety and functional design through his patented rupture disc monitor underlines the importance of innovation in industrial applications. As he continues to work at Ethyl Corporation, his contributions will undoubtedly pave the way for future advancements in the industry.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile