Tucson, AZ, United States of America

Clifford E Blanton

This inventor holds 1 USPTO granted patent. Top assignee: Raytheon Company. Active years: 2015.


% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 3(Granted Patents)


Company Filing History:


Years Active: 2015

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1 patent (USPTO):Explore Patents

Title: The Innovations of Clifford E. Blanton

Introduction

Clifford E. Blanton is a notable inventor based in Tucson, AZ. He has made significant contributions to the field of electrical engineering, particularly in the area of coaxial and stripline transitions. His work has been recognized for its innovative approach and practical applications.

Latest Patents

Clifford holds a patent for a device titled "Coaxial-to-stripline and stripline-to-stripline transitions including a shorted center via." This invention features a stripline that includes a first ground plane, a second ground plane, a first signal trace located between the two ground planes, and a center via that extends through the stripline. This center via is in electrical contact with both the first ground plane and the first signal trace, showcasing a clever design that enhances signal integrity.

Career Highlights

Clifford is currently employed at Raytheon Company, where he applies his expertise in developing advanced technologies. His work at Raytheon has allowed him to contribute to various projects that push the boundaries of innovation in the defense and aerospace sectors.

Collaborations

Throughout his career, Clifford has collaborated with talented individuals such as Benjamin L. Cannon and Kelly Ryian Stewart. These partnerships have fostered a creative environment that encourages the exchange of ideas and the development of groundbreaking technologies.

Conclusion

Clifford E. Blanton's contributions to the field of electrical engineering, particularly through his patent and work at Raytheon, highlight his role as an influential inventor. His innovative designs continue to impact the industry and inspire future advancements.

Profile summary based on public USPTO records.
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