Hansville, WA, United States of America

Cliff Oostman

This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Venus Concept Ltd.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Cliff Oostman. Retrieved from https://idiyas.com/inventor/cliff-oostman

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Cliff Oostman and His Skin-Rejuvenation Invention.

Introduction

Cliff Oostman is an inventor based in Hansville, Washington. His patent work includes an invention designed to support skin rejuvenation by combining two treatment technologies.

Latest Patents

Oostman is associated with 1 patent, titled “Esthetic Apparatus Useful for Increasing Skin Rejuvenation and Methods Thereof.” The invention describes a system that simultaneously applies pulsed electromagnetic field (PEMF) pulses and heat from a deep-tissue diathermy device to a region of a patient’s skin. The patent states that this combined application is designed to produce a skin-rejuvenation increase greater than the sum of the increases attributed to either treatment alone.

Career Highlights

Oostman is associated with Venus Concept Ltd., a company working in the aesthetic technology field. His patent reflects an approach that combines electromagnetic stimulation and controlled heating in a single skin-treatment system.

Collaborations

Oostman’s listed coworkers include Yoni Iger and Ognjen Petrovic. Their shared association with Venus Concept Ltd. connects their work to the company’s aesthetic technology activities.

Conclusion

Cliff Oostman’s patent focuses on combining PEMF and deep-tissue diathermy to support skin rejuvenation, highlighting his contribution to aesthetic treatment technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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