Location History:
- Rouge River, OR (US) (2020)
- Rogue River, OR (US) (2001 - 2023)
Company Filing History:
Years Active: 2001-2023
Title: Innovations of Cliff J Leidecker
Introduction
Cliff J Leidecker is a notable inventor based in Rogue River, Oregon. He has made significant contributions to the field of vapor deposition technology, holding a total of 12 patents. His work has advanced the methods and systems used in substrate processing.
Latest Patents
One of his latest patents is a system and method for vapor deposition of substrates with a circular substrate frame that rotates in a planetary motion and curved lens support arms. This innovative deposition system includes a housing with a fixture transfer assembly featuring a sloped fixture transfer rail. The system comprises multiple sequentially ordered deposition chambers connected by the fixture transfer rail. A controller interfaces with the processing chambers, and a fixture carrier assembly is adapted to contain at least one substrate. The fixture carrier assembly travels along the fixture transfer rail under the influence of gravity. The substrate fixture contains a substrate and is defined by multiple circular members arranged in a circular formation. Each circular member has an opening sized to receive the substrate, while lens support arms extend into the fixture frame opening to retain the substrate.
Career Highlights
Throughout his career, Cliff has worked with various companies, including Quantum Innovations, Inc. and Key Technology Corporation. His experience in these organizations has contributed to his expertise in vapor deposition technologies and systems.
Collaborations
Cliff has collaborated with notable individuals in his field, including Norman L Kester and John B Glarum. These collaborations have likely enriched his work and led to further innovations in his projects.
Conclusion
Cliff J Leidecker's contributions to vapor deposition technology and his impressive portfolio of patents highlight his role as a significant inventor in the industry. His innovative systems continue to influence substrate processing methods today.