Shanghai, China

Clay Sun

This inventor holds 1 USPTO granted patent. Top assignee: Honeywell International Inc.. Active years: 2014.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Clay Sun. Retrieved from https://idiyas.com/inventor/clay-sun

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 5(Granted Patents)


Company Filing History:


Years Active: 2014

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1 patent (USPTO):Explore Patents

Title: Innovations by Clay Sun in Face Mask Technology

Introduction

Clay Sun is an innovative inventor based in Shanghai, China. He has made significant contributions to the field of personal protective equipment, particularly with his patent for a face mask. His work is crucial in the ongoing efforts to enhance safety and health standards in various environments.

Latest Patents

Clay Sun holds a patent for a face mask, which showcases his commitment to improving public health. This invention is particularly relevant in today's world, where the demand for effective protective gear has surged.

Career Highlights

Clay Sun is currently employed at Honeywell International Inc., a company renowned for its advancements in technology and safety solutions. His role at Honeywell allows him to leverage his expertise in developing innovative products that meet the needs of consumers and industries alike.

Collaborations

Clay has collaborated with talented coworkers, including Yajun Edwin Zhang and Eric Xia. Their combined efforts contribute to the innovative environment at Honeywell, fostering the development of cutting-edge technologies.

Conclusion

Clay Sun's contributions to face mask technology exemplify the importance of innovation in enhancing public safety. His work at Honeywell International Inc. and his collaborations with skilled colleagues further highlight the collaborative nature of technological advancements.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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