Florence, Italy

Claudio Ciamberlini

This inventor holds 1 USPTO granted patent. Top assignee: CEO Centro Di Eccellenza Optronica. Active years: 2003.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Claudio Ciamberlini. Retrieved from https://idiyas.com/inventor/claudio-ciamberlini

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2003

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1 patent (USPTO):Explore Patents

Title: Claudio Ciamberlini: Innovator in Optical Technology

Introduction

Claudio Ciamberlini is a notable inventor based in Florence, Italy. He has made significant contributions to the field of optical technology, particularly in the design of protective gear. His innovative approach has led to the development of a unique helmet that enhances user safety and visibility.

Latest Patents

Ciamberlini holds a patent for a protective helmet with an improved rear-view optical system. This helmet features an optical path that allows users to see images of the scene behind them. The design includes a dorsal entry for light to enter, an objective lens, an eyepiece, and a reflecting optical member that directs the image to the wearer's eye. This invention aims to improve situational awareness for users in various environments.

Career Highlights

Claudio Ciamberlini serves as the CEO of Centro di Eccellenza Optronica. Under his leadership, the company has focused on advancing optical technologies and enhancing safety equipment. His expertise and vision have positioned the company as a leader in the field.

Collaborations

Ciamberlini has worked alongside talented individuals such as Giuseppe Longobardi and Franco Francini. Their collaborative efforts have contributed to the success of various projects within the company.

Conclusion

Claudio Ciamberlini's innovative work in optical technology exemplifies the impact of creativity and engineering in enhancing safety. His contributions continue to influence the industry and inspire future advancements.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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