Munich, Germany

Claudia Siemer

This inventor holds 1 USPTO granted patent and 1 published patent application, plus 1 CIPO patent and 2 EPO patents. Top assignee: Elea Service Gmbh. Active years: 2024.

USPTO Granted Patents = 1 

% Patents Active = 100.0


 

Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2024

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1 patent (USPTO):Explore Patents

Title: Claudia Siemer: Innovator in Process Monitoring Technology

Introduction

Claudia Siemer is a notable inventor based in Munich, Germany. She has made significant contributions to the field of process monitoring, particularly in the treatment of media. Her innovative approach has led to the development of a patented system that enhances food preservation techniques.

Latest Patents

Claudia holds a patent for a "Method and system for process monitoring the treatment of media." This system is designed to ensure and standardize successful treatment processes, especially in compliance with HACCP standards for food preservation. The system includes an electroporator that treats a medium with a pulsed electric field, along with measuring devices that determine changes in condition parameters of the medium. An evaluation device compares these changes to predetermined target values and issues warning signals when discrepancies exceed acceptable limits.

Career Highlights

Throughout her career, Claudia has worked with prominent companies such as Elea Service GmbH and Nestec S.A. Her experience in these organizations has allowed her to refine her expertise in process monitoring technologies and food safety.

Collaborations

Claudia has collaborated with talented professionals in her field, including Stefan Toepfl and Julian Witt. These partnerships have contributed to her innovative work and the successful development of her patented technologies.

Conclusion

Claudia Siemer is a pioneering inventor whose work in process monitoring technology has the potential to significantly impact food preservation methods. Her dedication to innovation and collaboration continues to drive advancements in this important field.

Profile summary based on public USPTO records.
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