Company Filing History:
Years Active: 2025
Title: Claudia Keibler-Willner: Innovator in Barrier Layer Systems
Introduction
Claudia Keibler-Willner is a prominent inventor based in Dresden, Germany. She has made significant contributions to the field of material science, particularly in the development of barrier layer systems. Her innovative work focuses on creating layers that provide effective protection against oxygen and water vapor.
Latest Patents
Claudia holds a patent for a "Barrier layer system and method for producing a barrier layer system." This invention features a layer system that includes barrier properties against oxygen and water vapor. The design incorporates an alternating layer system of at least two aluminum oxide layers and at least two titanium oxide layers. These layers are deposited alternately on top of one another using atomic layer deposition (ALD) with a layer thickness ranging from 5 nm to 20 nm. Additionally, a first Parylene layer is deposited on one side of the alternating layer system by chemical vapor deposition (CVD), with a thickness between 0.1 μm to 50 μm. Claudia's innovative approach enhances the durability and effectiveness of barrier systems.
Career Highlights
Claudia is affiliated with the Fraunhofer Society for the Advancement of Applied Research, where she continues to push the boundaries of material science. Her work has garnered attention for its practical applications in various industries, including packaging and electronics.
Collaborations
Claudia collaborates with talented colleagues such as Emmy Törker and Franz Selbmann, contributing to a dynamic research environment that fosters innovation and creativity.
Conclusion
Claudia Keibler-Willner's contributions to barrier layer systems exemplify her commitment to advancing material science. Her innovative patent and collaborative efforts highlight her role as a leading inventor in her field.