Meckenheim, Germany

Claudia Fuhrmann

This inventor holds 1 USPTO granted patent and 1 EPO patent. Top assignee: Evonik Degussa Gmbh. Active years: 2018.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Claudia Fuhrmann. Retrieved from https://idiyas.com/inventor/claudia-fuhrmann

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

 

Average Co-Inventor Count = 9.0

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 2018

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1 patent (USPTO):Explore Patents

Title: Claudia Fuhrmann: Innovator in Aqueous Colloidal Silica Technology

Introduction

Claudia Fuhrmann is a notable inventor based in Meckenheim, Germany. She has made significant contributions to the field of materials science, particularly in the development of high-purity aqueous colloidal silica sols. Her innovative work has implications for various industrial applications.

Latest Patents

Claudia holds a patent for a "Process for preparing aqueous colloidal silica sols of high purity from alkali metal silicate solutions." This invention relates to a method for producing high-purity aqueous colloidal silica sols from silicate solutions. It also addresses the specific profile of impurities in these sols and includes high-purity silicon dioxide that can be obtained through dewatering.

Career Highlights

Claudia Fuhrmann is associated with Evonik Degussa GmbH, a leading company in specialty chemicals. Her role at the company has allowed her to focus on innovative processes that enhance the quality and purity of silica products. Her expertise in this area has positioned her as a key player in the field.

Collaborations

Throughout her career, Claudia has collaborated with esteemed colleagues such as Dieter Oehm and Christian Panz. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas, further advancing the field of colloidal silica technology.

Conclusion

Cl

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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