This inventor holds 1 USPTO granted patent. Top assignee: Powell Fabrication & Manufacturing, Inc.. Active years: 1995.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 1995
Title: The Innovative Contributions of Clarence Powell
Introduction
Clarence Powell is a notable inventor based in St. Louis, MO (US). He has made significant contributions to the field of gas scrubbing technology. His innovative designs have led to advancements that enhance efficiency in industrial applications.
Latest Patents
One of Clarence Powell's key patents is for a "Horizontal pass, multiple packed-bed gas scrubber." This invention features relatively low pressure drop flow paths for both gas and scrubbing liquid. It allows for large-scale mass transfer of solute from gas to liquid. The scrubber is designed to be volumetrically compact while maintaining extremely high scrubbing efficiency for large gas flow rates. Each packed bed is equipped with packing that is wetted by liquid emitted from low pressure drop orifices. The piping is supported by baffles that ensure gas flows through the packing, avoiding any inadequately wetted zones.
Career Highlights
Clarence Powell is associated with Powell Fabrication & Manufacturing, Inc., where he applies his expertise in gas scrubbing technology. His work has been instrumental in developing solutions that meet the demands of modern industrial processes. With 1 patent to his name, he continues to push the boundaries of innovation in his field.
Collaborations
Throughout his career, Clarence has collaborated with talented individuals such as Duane Powell and Ralph F Strigle, Jr. These partnerships have fostered a creative environment that encourages the development of groundbreaking technologies.
Conclusion
Clarence Powell's contributions to gas scrubbing technology exemplify the impact of innovative thinking in industrial applications. His work not only enhances efficiency but also sets a standard for future advancements in the field.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile