Company Filing History:
Years Active: 2024
Title: Innovations of Chunying Han in Overlay Alignment Technology.
Introduction
Chunying Han is a notable inventor based in Beijing, China. He has made significant contributions to the field of overlay alignment technology. His work focuses on improving the accuracy of measurements in patterned wafers, which is crucial for various applications in electronics.
Latest Patents
Chunying Han holds a patent for an "Overlay alignment mark and method for measuring overlay error." This invention provides an innovative solution for measuring overlay errors in patterned wafers. The patent describes an overlay alignment mark that includes a first pattern, which is a portion of the lower-layer pattern, and a second pattern, which is a portion of the upper-layer pattern. The design ensures that the orthographic projections of the solid features and hollowed features overlap, enhancing measurement precision.
Career Highlights
Chunying Han is currently employed at Zhongke Jingyuan Electron Limited in Beijing. His role at the company allows him to apply his expertise in overlay alignment technology. With a focus on innovation, he continues to contribute to advancements in the field.
Collaborations
Chunying Han collaborates with talented individuals such as Weimin Ma and Chengcheng Liu. Their teamwork fosters a creative environment that drives innovation and enhances the development of new technologies.
Conclusion
Chunying Han's contributions to overlay alignment technology exemplify the importance of innovation in the electronics industry. His patent and ongoing work at Zhongke Jingyuan Electron Limited highlight his commitment to advancing measurement techniques in patterned wafers.