Chunyan Xin

Title: The Innovative Contributions of Chunyan Xin

Introduction

Chunyan Xin is a prominent inventor based in Shanghai, China. He has made significant contributions to the field of semiconductor technology, particularly in the development of CMOS image sensors. With a total of 3 patents to his name, Chunyan continues to push the boundaries of innovation in his field.

Latest Patents

Chunyan Xin's latest patents include a "Method of making CMOS image sensor-hybrid silicide." This patent outlines techniques for manufacturing a CMOS image sensor, detailing the formation of various wells and layers within a semiconductor substrate. Another notable patent is the "Method and device for CMOS image sensing with separate source formation," which describes a method for image sensing that involves the implantation of ions to create source and drain regions in the substrate.

Career Highlights

Chunyan Xin is currently employed at Semiconductor Manufacturing International Corporation, a leading company in the semiconductor industry. His work focuses on advancing the technology behind image sensors, which are crucial for various applications in electronics and imaging.

Collaborations

Chunyan has collaborated with several talented individuals in his field, including Jianping Yang and Jieguang Huo. Their combined expertise contributes to the innovative projects they undertake together.

Conclusion

Chunyan Xin's contributions to semiconductor technology and his innovative patents highlight his role as a key figure in the advancement of CMOS image sensors. His work continues to influence the industry and pave the way for future developments.