This inventor holds 1 USPTO granted patent. Top assignees: Chinese Academy of Sciences, Vtt-Ntm Ou. Active years: 2018.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:

Years Active: 2018
Title: Innovations of Chunshui Jin
Introduction
Chunshui Jin is a notable inventor based in Changchun, China. He has made significant contributions to the field of optical engineering, particularly through his innovative patents. His work focuses on enhancing the precision and functionality of diffraction interferometers.
Latest Patents
Chunshui Jin holds a patent for a "Large numerical aperture phase-shifting dual pinhole diffraction interferometer and its test method." This invention features a diffraction interferometer that includes a reference light passage, a test light passage, and a pinhole substrate. The pinhole substrate consists of a test pinhole and a reference pinhole. The diffracted wavefront emitted from the test pinhole is reflected by the optical component to be tested, providing surface shape information. The design allows for the separation of reference light and test light, preventing disturbances that could affect the interferogram status during phase-shifting. This innovative approach enhances the accuracy of optical measurements.
Career Highlights
Chunshui Jin has worked with prestigious institutions, including the Chinese Academy of Sciences and VTT-NTM Oy. His experience in these organizations has contributed to his expertise in optical technologies and innovations.
Collaborations
Throughout his career, Chunshui Jin has collaborated with notable colleagues such as Nikolay Voznesenskiy and Dongmei Ma. These partnerships have fostered advancements in their respective fields and have led to the development of cutting-edge technologies.
Conclusion
Chunshui Jin's contributions to optical engineering through his patent and collaborations highlight his role as an influential inventor. His work continues to impact the field, paving the way for future innovations in diffraction interferometry.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile