Chunshing Chen

Title: Innovations of Chunshing Chen in Semiconductor Technology

Introduction

Chunshing Chen is a notable inventor based in Chang-Hwa, Taiwan. He has made significant contributions to the field of semiconductor technology, particularly in the area of alignment mark recovery on integrated circuit wafers. With a total of 2 patents, his work has advanced the efficiency and effectiveness of semiconductor manufacturing processes.

Latest Patents

Chunshing Chen's latest patents include innovative methods for recovering alignment marks after chemical mechanical polishing. The first patent describes a mask pattern and method that allows for the recovery of alignment marks on an integrated circuit wafer without the need for additional masks. This method provides a means to recover alignment marks after forming a metal layer on a planarized inter-level dielectric layer. The conventional approach of placing the pattern on a separate mask has been improved by integrating it into the end regions of the mask used for forming a pattern on the active region of the wafer. To accommodate this integration, the pattern is divided into two parts, requiring two exposure steps when used to expose a layer of photoresist.

Career Highlights

Chunshing Chen is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His work at TSMC has positioned him as a key player in advancing semiconductor manufacturing technologies.

Collaborations

Chunshing has collaborated with notable coworkers, including Jui-Yu Chang and Syun-Ming Jang. Their combined expertise has contributed to the successful development of innovative solutions in semiconductor technology.

Conclusion

Chunshing Chen's contributions to semiconductor technology through his patents and work at TSMC highlight his role as an influential inventor in the industry. His innovative methods for recovering alignment marks are paving the way for more efficient semiconductor manufacturing processes.