This inventor holds 1 USPTO granted patent. Top assignees: Electronics and Telecommunications Research Institute, Pohang University of Science and Technology Foundation. Active years: 2025.
Company Filing History:
1 out of 11,745 
1 out of 1,100 Years Active: 2025
Title: Innovations of Chunghwan Jung
Introduction
Chunghwan Jung is a notable inventor based in Pohang-si, South Korea. He has made significant contributions to the field of security technology, particularly through his innovative patent.
Latest Patents
One of Chunghwan Jung's key patents is a security code that includes a first region and a second region. This security code features a metal layer, a first dielectric pattern on the metal layer in the first region, and a polymer pattern on the metal layer in the second region. Additionally, it incorporates a first metal pattern on the dielectric pattern and a second metal pattern on the polymer pattern. The polymer pattern is made from a material different from that of the first dielectric pattern, and the thickness of the polymer pattern varies from that of the first dielectric pattern. This invention showcases his expertise in creating advanced security solutions.
Career Highlights
Chunghwan Jung has worked with prominent organizations such as the Electronics and Telecommunications Research Institute and the Postech Research and Business Development Foundation. His experience in these institutions has allowed him to develop and refine his innovative ideas.
Collaborations
Chunghwan Jung has collaborated with talented individuals in his field, including Soo-Jung Kim and Junsuk Rho. These partnerships have contributed to the advancement of his research and inventions.
Conclusion
Chunghwan Jung's contributions to security technology through his innovative patent demonstrate his commitment to advancing the field. His work continues to influence the development of secure systems and technologies.