Company Filing History:
Years Active: 2017
Title: Innovator Chung-Yu Yeh: Pioneering Advances in Film Deposition Technology
Introduction: Chung-Yu Yeh is a noteworthy inventor based in Taichung, Taiwan, whose innovative contributions to film deposition technology have led to the development of two significant patents. His work reflects a commitment to enhancing the efficiency and effectiveness of film deposition systems, a crucial aspect of various high-tech applications.
Latest Patents: Chung-Yu Yeh holds two patents that focus on substrate carrier units and their integration into film deposition systems. His first patent, titled "Substrate Carrier Unit for a Film Deposition Apparatus," describes a substrate carrier that incorporates a phase transition material. This material, with a melting point ranging from 18°C to 95°C, can absorb thermal energy from the substrate carrier, allowing it to change its phase from solid to liquid effectively.
The second patent, "Film Deposition System Having a Substrate Carrier and a Cooling Device," builds on this innovation by detailing a complete film deposition system. This system includes not just the substrate carrier and the phase transition material, but also a cooling device that is designed to absorb thermal energy from the substrate carrier, facilitating the phase change of the phase transition material from liquid back to solid, thus optimizing the deposition process.
Career Highlights: Chung-Yu Yeh's career is marked by his dedication to advancing film deposition technologies. Working at Linco Technology Co., Ltd., he has established himself as an integral part of the company’s innovation team. His educational background and hands-on experience in the field have enabled him to develop practical solutions to complex challenges in film deposition.
Collaborations: In his endeavors, Chung-Yu Yeh collaborates with talented coworkers, including Cheng-Peng Yeh and Huei-Chia Su. Together, this skilled team fosters a dynamic environment that promotes creativity and the pursuit of cutting-edge technological advancements.
Conclusion: Chung-Yu Yeh stands out in the realm of invention through his impactful patents and contributions to the field of film deposition technology. His innovative approach and collaborative spirit pave the way for future advancements in this critical area, demonstrating the importance of continuous improvement in manufacturing and materials science.