Taipei, Taiwan

Chung-Yih Chen

This inventor holds 1 USPTO granted patent. Top assignee: Mosel Vitelic Corporation. Active years: 2002.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Chung-Yih Chen. Retrieved from https://idiyas.com/inventor/chung-yih-chen-qepnn7ej

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2002

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1 patent (USPTO):Explore Patents

Title: Innovations by Chung-Yih Chen

Introduction

Chung-Yih Chen is a notable inventor based in Taipei, Taiwan. He has made significant contributions to the field of semiconductor technology. His innovative methods have paved the way for advancements in the manufacturing processes of semiconductor devices.

Latest Patents

Chung-Yih Chen holds a patent for a method titled "Method for making a concave bottom oxide within a trench." This patent discloses a detailed process that includes several steps: providing a semiconductor substrate, forming an insulating layer, defining the insulating layer to create an opening, dry-etching the exposed substrate, depositing oxide layers, annealing, and etching back to form a spacer and a concave bottom oxide. This invention enhances the efficiency and effectiveness of semiconductor fabrication.

Career Highlights

Chung-Yih Chen is currently associated with Mosel Vitelic Corporation, where he applies his expertise in semiconductor technology. His work has been instrumental in developing innovative solutions that address challenges in the industry.

Collaborations

Chung-Yih Chen has collaborated with talented individuals such as Yen-Rong Chang and Chien-Hung Chen. These collaborations have fostered a creative environment that encourages the exchange of ideas and advancements in technology.

Conclusion

Chung-Yih Chen's contributions to semiconductor technology through his innovative patent demonstrate his commitment to advancing the field. His work continues to influence the industry and inspire future innovations.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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