Company Filing History:
Years Active: 2020
Title: Innovations of Chung-Yi Yen in Photomask Technology
Introduction
Chung-Yi Yen is a notable inventor based in Taichung, Taiwan. He has made significant contributions to the field of semiconductor manufacturing, particularly in photomask technology. His innovative approach has led to the development of a unique patent that enhances the efficiency of photomask handling.
Latest Patents
Chung-Yi Yen holds a patent for a "Photomask purging system and method." This invention involves a method that includes opening a pod containing a photomask, gripping the photomask with an end effector, and moving the end effector to a designated location. At this location, a gas is exhausted toward the gripped photomask, and the end effector is rotated with respect to a horizontal plane. This innovative method aims to improve the cleanliness and handling of photomasks in semiconductor processes. He has 1 patent to his name.
Career Highlights
Chung-Yi Yen is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His work at this prestigious company has allowed him to apply his inventive skills in a practical setting, contributing to advancements in technology.
Collaborations
Chung-Yi has collaborated with talented coworkers, including Mei-Tsu Lai and Chen-Hung Lin. Their teamwork has fostered an environment of innovation and creativity, leading to successful projects in the semiconductor field.
Conclusion
Chung-Yi Yen's contributions to photomask technology exemplify the importance of innovation in the semiconductor industry. His patent and collaborative efforts highlight his commitment to advancing technology and improving manufacturing processes.