Taoyuan, Taiwan

Chung-Yi Chen

This inventor holds 1 USPTO granted patent and 5 published patent applications and 1 EPO patent. Top assignee: Delta Electronics, Inc.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Chung-Yi Chen. Retrieved from https://idiyas.com/inventor/chung-yi-chen-l7d35iq6

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

 

Average Co-Inventor Count = 1.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Chung-Yi Chen: Innovator in Flexible Copper Clad Laminates

Introduction

Chung-Yi Chen is an inventor based in Taoyuan City, Taiwan. He is currently associated with Delta Electronics, Inc. Although he does not have any granted patents, his work in the field of flexible copper clad laminates showcases his innovative spirit and technical expertise.

Latest Patent Applications

Chung-Yi Chen has submitted several patent applications related to flexible copper clad laminates. One of his notable applications describes a flexible copper clad laminate that includes a polyimide substrate and a nickel-copper alloy layer formed on at least one surface of the substrate by electroless plating. This alloy layer contains nickel, copper, and phosphorus, with specific weight ratios and content levels that enhance its performance. The copper layer is formed on the side of the nickel-copper alloy layer that is away from the polyimide substrate, creating a metal conducting layer suitable for high-frequency transmission. Another application details a flexible copper clad laminate with electrochemical corrosion resistance and sufficient peel strength, facilitating the production of flexible printed circuit boards.

Conclusion

Chung-Yi Chen's contributions to the field of flexible copper clad laminates reflect his commitment to innovation and advancement in technology. His latest patent applications highlight the potential for improved materials in electronic applications.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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