Chung Yi Chang

Title: Chung Yi Chang: Innovator in Semiconductor Technology

Introduction

Chung Yi Chang is a prominent inventor based in Taipei, Taiwan. He has made significant contributions to the field of semiconductor technology, particularly in the etching processes used during semiconductor device manufacturing. His innovative approach has led to the development of a unique etching solution that enhances the efficiency and safety of semiconductor production.

Latest Patents

Chung Yi Chang holds a patent for an etching solution and method for aluminum nitride. This patent describes a solution that is suitable for etching aluminum nitride (AlN) from a semiconductor substrate without damaging the underlying silicon material. The etching solution comprises a cationic surfactant, water, a base, and a water-miscible organic solvent. This innovation is crucial for the manufacturing of semiconductor devices that incorporate both AlN and silicon materials.

Career Highlights

Chung Yi Chang is currently employed at Versum Materials US, LLC, where he continues to work on advancements in semiconductor technologies. His expertise in etching solutions has positioned him as a valuable asset in the industry. With a focus on improving manufacturing processes, he has contributed to the development of safer and more effective methods for semiconductor production.

Collaborations

Chung Yi Chang has collaborated with notable colleagues, including Wen Dar Liu and Yi-chia Lee. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas within the semiconductor field.

Conclusion

Chung Yi Chang's contributions to semiconductor technology, particularly through his patented etching solution, highlight his role as an influential inventor in the industry. His work not only enhances manufacturing processes but also ensures the integrity of semiconductor devices.