Chung-Wei Chiang

Title: Innovations of Chung-Wei Chiang

Introduction

Chung-Wei Chiang is a notable inventor based in Taoyuan, Taiwan. He has made significant contributions to the field of technology, particularly in the area of materials science. With a total of two patents to his name, Chiang's work showcases his innovative approach to solving complex problems in his industry.

Latest Patents

Chiang's latest patents include a method of selectively removing tungsten over silicon oxide. This invention provides a slurry composition that includes abrasive particles, halogen oxide, and a nitroxide compound. The combination of halogen oxide and nitroxide compound creates a synergistic effect that effectively removes a substrate containing tungsten and silicon oxide. Additionally, he has developed a silica that has metal ions absorbed thereon, along with a method for fabricating it. This silica is modified with persulfate salt, and the method involves heating a solution containing silica and persulfate salt to facilitate the reaction, allowing the silica to absorb metal ions.

Career Highlights

Chiang is currently employed at Uwiz Technology Co., Ltd., where he continues to push the boundaries of innovation. His work has not only advanced the technology in his field but has also contributed to the growth of his company.

Collaborations

Chiang collaborates with talented individuals such as Yun-Lung Ho and Song-Yuan Chang. Their teamwork fosters an environment of creativity and innovation, leading to groundbreaking advancements in their projects.

Conclusion

Chung-Wei Chiang is a distinguished inventor whose contributions to technology and materials science are noteworthy. His patents reflect his innovative spirit and commitment to advancing his field. Through his work at Uwiz Technology Co., Ltd., he continues to inspire future innovations.