Shulin, Taiwan

Chung-Min Yeh

This inventor holds 1 USPTO granted patent. Top assignee: Shin Zu Shing Co., Ltd.. Active years: 2012.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Chung-Min Yeh. Retrieved from https://idiyas.com/inventor/chung-min-yeh

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 2012

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1 patent (USPTO):Explore Patents

Title: Innovations of Chung-Min Yeh

Introduction

Chung-Min Yeh is a notable inventor based in Shulin, Taiwan. He has made significant contributions to the field of electronic devices, particularly through his innovative designs and patents. His work exemplifies the intersection of functionality and technology in modern devices.

Latest Patents

Chung-Min Yeh holds a patent for a hinge and an electronic device with the same. This invention features a hinge mounted between a cover and a base of an electronic device. It includes a first actuating unit, a pivoting limit, and a second actuating unit. The first actuating unit has two stops, while the pivoting limit is pivotally mounted between these stops. The second actuating unit selectively abuts the first and second sides of the pivoting limit. This design allows the cover of the electronic device to rotate fully by 180 degrees in either direction, while still providing a limiting function to protect the inner wires.

Career Highlights

Chung-Min Yeh is associated with Shin Zu Shing Co., Ltd., where he continues to innovate and develop new technologies. His work has been instrumental in enhancing the usability and durability of electronic devices.

Collaborations

Chung-Min Yeh collaborates with Shun-Yu Hung, contributing to the advancement of their projects and innovations.

Conclusion

Chung-Min Yeh's contributions to the field of electronic devices through his innovative hinge design demonstrate his expertise and commitment to enhancing technology. His work continues to influence the industry and inspire future innovations.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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