Kowloon, China

Chung Leung Wong

This inventor holds 11 USPTO granted patents and 1 published patent application and 2 EPO patents. Top assignee: Covestro Deutschland Ag. Active years: 2011-2016.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Chung Leung Wong. Retrieved from https://idiyas.com/inventor/chung-leung-wong

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 11 

% Patents Active = 81.8

 

Average Co-Inventor Count = 1.2

ph-index = 9

Forward Citations = 185(Granted Patents)


Location History:

  • Kowloon, CN (2011 - 2013)
  • Hong Kong, CN (2016)

Company Filing History:


Years Active: 2011-2016

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11 patents (USPTO):Explore Patents

Title: Innovations of Chung Leung Wong

Introduction

Chung Leung Wong is a notable inventor based in Kowloon, CN. He has made significant contributions to the field of printing technology, holding a total of 11 patents. His work primarily focuses on advancements in dye diffusion thermal transfer printing.

Latest Patents

One of his latest patents involves a special layer construction and a unique plastic film designed for dye diffusion thermal transfer printing. This invention outlines a process for producing such a layer construction, which is suitable for creating security and valuable documents. The innovative approach enhances the quality and efficiency of printing processes.

Career Highlights

Chung Leung Wong has worked with prominent companies such as Covestro Deutschland AG and Covestro Intellectual Property GmbH & Co. KG. His experience in these organizations has allowed him to refine his expertise in the field of printing technology and intellectual property.

Collaborations

Some of his notable coworkers include Heinz Pudleiner and Klaus Meyer, who have contributed to his projects and innovations.

Conclusion

Chung Leung Wong's contributions to the field of printing technology through his patents and collaborations highlight his role as an influential inventor. His work continues to impact the industry positively.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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