Daejeon, South Korea

Chung Lee

This inventor holds 1 USPTO granted patent. Top assignee: Lyv Sciences Co., Ltd.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Chung Lee. Retrieved from https://idiyas.com/inventor/chung-lee-oa6klh9c

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 1.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Innovations of Chung Lee in Hyaluronic Acid Fillers

Introduction

Chung Lee is a notable inventor based in Daejeon, South Korea. He has made significant contributions to the field of cosmetic science, particularly in the development of hyaluronic acid fillers. His innovative approach has led to advancements that enhance the effectiveness and safety of these products.

Latest Patents

Chung Lee holds a patent for a hyaluronic acid filler characterized by high viscoelasticity and cohesiveness. This invention exhibits improved high viscoelastic flow characteristics, combining the advantages of both monophasic and biphasic hyaluronic acid fillers. The filler maintains its shape while minimizing movement during injection into the skin, making it particularly effective for wrinkle improvement and soft tissue augmentation, including areas such as cheeks, breasts, noses, lips, and hips. Additionally, the duration of effectiveness in the human body is increased, and the side effects are minimal, even with a small amount of crosslinking agent used during the preparation process.

Career Highlights

Chung Lee is associated with Lyv Sciences Co., Ltd., where he continues to innovate in the field of cosmetic fillers. His work has garnered attention for its potential to improve aesthetic procedures and patient outcomes.

Collaborations

Chung collaborates with talented individuals such as Cheol Jang and Ji Sun Kim, contributing to a dynamic team focused on advancing cosmetic technologies.

Conclusion

Chung Lee's contributions to the field of hyaluronic acid fillers represent a significant advancement in cosmetic science. His innovative patent showcases the potential for improved aesthetic treatments with enhanced safety and effectiveness.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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