Miaoli, Taiwan

Chung-I Lin

This inventor holds 1 USPTO granted patent. Top assignee: Innolux Corporation. Active years: 2017.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Chung-I Lin. Retrieved from https://idiyas.com/inventor/chung-i-lin-0571ychi

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 14.0

ph-index = 1


Company Filing History:


Years Active: 2017

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1 patent (USPTO):Explore Patents

Title: Chung-I Lin: Innovator in Conductive Substrate Technology

Introduction

Chung-I Lin is a prominent inventor based in Miaoli, Taiwan. He has made significant contributions to the field of conductive substrates and touch display devices. His innovative work has led to the development of a patented technology that enhances the functionality of touch displays.

Latest Patents

Chung-I Lin holds a patent for a conductive substrate and touch display device. The patent describes a conductive substrate that comprises a substrate, a plurality of conductive patterns, and a plurality of optical compensation patterns. The conductive patterns extend along a first direction and are sequentially disposed on the substrate along a second direction. The optical compensation patterns are staggered from the conductive patterns along the second direction on the substrate. An edge of at least one of the conductive patterns extending along the first direction has a plurality of conductive protrusions, and an edge of at least one of the optical compensation patterns extending along the first direction has a plurality of optical compensation protrusions. This innovative design significantly improves the performance of touch display devices.

Career Highlights

Chung-I Lin is associated with Innolux Corporation, a leading company in the display technology industry. His work at Innolux has allowed him to focus on advancing touch display technologies and conductive substrate designs. His contributions have been instrumental in enhancing the user experience in electronic devices.

Collaborations

Chung-I Lin has collaborated with notable colleagues, including Jeng-Feng Shih and Kuan-Chih Chen. These collaborations have fostered a creative environment that encourages innovation and the development of cutting-edge technologies.

Conclusion

Chung-I Lin's work in conductive substrate technology exemplifies the spirit of innovation in the electronics industry. His patented inventions continue to influence the design and functionality of touch display devices, showcasing his significant impact on the field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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