This inventor holds 1 USPTO granted patent. Top assignee: Electronics and Telecommunications Research Institute. Active years: 2001.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2001
Title: Innovations of Chung-Hwan Kim in Inductor Technology
Introduction
Chung-Hwan Kim is a notable inventor based in Taejon, South Korea. He has made significant contributions to the field of electronics, particularly in the development of integrated inductor devices. His innovative approach has led to advancements that enhance the performance of electronic components.
Latest Patents
Chung-Hwan Kim holds a patent for an "Integrated inductor device and method for fabricating the same." This patent describes a method for fabricating an inductor device that includes several steps. These steps involve forming trenches in a substrate through selective etching, implanting dopants into the trenches, and creating an oxide layer. The process also includes forming a dielectric layer that fills the entrance of the trenches, resulting in air-gap layers that reduce parasitic capacitance and magnetic coupling. He has 1 patent to his name.
Career Highlights
Chung-Hwan Kim is associated with the Electronics and Telecommunications Research Institute, where he has been instrumental in advancing research and development in electronic technologies. His work has not only contributed to academic knowledge but has also had practical applications in the industry.
Collaborations
Chung-Hwan Kim has collaborated with notable colleagues such as Min Sang Park and Hyun-Kyu Yu. Their combined expertise has fostered a productive research environment, leading to innovative solutions in the field of electronics.
Conclusion
Chung-Hwan Kim's contributions to the field of integrated inductor devices exemplify the impact of innovative thinking in technology. His work continues to influence advancements in electronics, showcasing the importance of research and collaboration in driving progress.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
