Company Filing History:
Years Active: 2004
Title: The Innovative Contributions of Chung Hsing Chang in Photomask Technology
Introduction: Chung Hsing Chang is a notable inventor based in Hsin-Chu, Taiwan, recognized for his significant contributions to the field of photolithography. With a keen understanding of the complexities involved in creating photomasks, Chang has developed innovative methods that enhance the manufacturing process.
Latest Patents: Chang holds a patent titled "Process flow and pellicle type for 157 nm mask making." This invention presents a method for forming a photomask and pellicle suitable for use in photolithography, specifically with electromagnetic radiation in the wavelength range from above 250 nm to below 150 nm. The patent outlines that opaque regions of the photomask are formed directly within a transparent F-doped quartz layer using techniques such as gallium ion staining through a focused ion beam (FIB) or carbon atom deposition within trenches created in the transparent layer. This process allows for improved alignment and fitting of hard pellicles, effectively preventing warping during production.
Career Highlights: Chung Hsing Chang is currently working for Taiwan Semiconductor Manufacturing Company Limited (TSMC), a leader in the semiconductor manufacturing industry. His role has placed him at the forefront of innovative technologies that drive advancements in semiconductor fabrication.
Collaborations: Throughout his career, Chang has collaborated with esteemed coworkers, including San-De Tzu and Anthony Yen. Their joint efforts have contributed to the successful development and implementation of cutting-edge technologies within the semiconductor sector, significantly impacting the effectiveness of photomask production.
Conclusion: Chung Hsing Chang exemplifies the spirit of innovation within the realm of photolithography. His patented processes not only streamline the creation of photomasks but also seek to improve the overall performance and accuracy of semiconductor manufacturing. As a professional at TSMC, his work continues to influence the evolution of this critical technology in the industry.