This inventor holds 1 USPTO granted patent. Top assignee: The Hong Kong Polytechnic University. Active years: 2008.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2008
Title: Innovations in Metal Oxide Nanowires by Chung Ho Woo
Introduction
Chung Ho Woo is a prominent inventor based in Hong Kong, CN. He has made significant contributions to the field of nanotechnology, particularly in the manufacturing of metal oxide nanowires. His innovative approach has the potential to revolutionize the production of nanodevices and nanosensors.
Latest Patents
Chung Ho Woo holds 1 patent for his invention titled "Methods of manufacturing metal oxide nanowires." This patent addresses the challenges associated with existing vapor phase evaporation methods, which require high operation temperatures or vacuum conditions. His method allows for the manufacturing of metal oxide nanowires by heating a metal to form a non-linear substantially planar structure. The metal is then exposed to an oxygen and water vapor containing air stream, enabling the formation of nanowires at relatively low temperatures without the need for vacuum. This innovation not only reduces manufacturing costs but also allows for the simultaneous production of different densities of metal oxide nanowires.
Career Highlights
Chung Ho Woo is affiliated with The Hong Kong Polytechnic University, where he continues to advance research in nanotechnology. His work has garnered attention for its practical applications in various fields, including electronics and materials science.
Collaborations
Chung Ho Woo has collaborated with notable colleagues such as Yang Liu and Chunhua Xu. Their combined expertise has contributed to the development of innovative solutions in the realm of nanotechnology.
Conclusion
Chung Ho Woo's contributions to the field of metal oxide nanowires exemplify the importance of innovation in advancing technology. His patented methods offer a promising avenue for the future of nanodevices and nanosensors.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
