Chung-Hao Tzeng

Title: Innovations by Chung-Hao Tzeng

Introduction

Chung-Hao Tzeng is a notable inventor based in Hsin-chu, Taiwan. He has made significant contributions to the field of semiconductor manufacturing, particularly through his innovative designs and patents. With a total of 2 patents, Tzeng's work focuses on enhancing the efficiency and effectiveness of fluid dispensing systems.

Latest Patents

One of Tzeng's latest patents is a combination nozzle and vacuum hood that is self-cleaning. This invention provides a unique solution by integrating a nozzle with a vacuum hood. The vacuum hood features a chamber that surrounds the nozzle tip, effectively removing residue through a vacuum that flows past the nozzle tip. This innovative design prevents residue from interfering with the spraying action or dripping down. The method outlined in this patent allows for the dispensing of fluid from a nozzle without any dripping, which is crucial in semiconductor wafer processing. The process involves several steps, including dispensing fluid on a rotating semiconductor wafer, terminating fluid flow, creating an upward gas flow, capturing fluid residue, and repeating the process for subsequent wafers.

Career Highlights

Chung-Hao Tzeng is currently employed at Taiwan Semiconductor Manufacturing Company Ltd. His work at this leading semiconductor manufacturer has allowed him to collaborate with other talented professionals in the industry.

Collaborations

Some of his notable coworkers include Dong-Shiuh Cheng and Cherng-Yui Chang. Their collaborative efforts contribute to the advancement of technology in semiconductor manufacturing.

Conclusion

Chung-Hao Tzeng's innovative contributions to the field of semiconductor manufacturing, particularly through his self-cleaning nozzle and vacuum hood, demonstrate his commitment to improving industry standards. His work continues to influence the efficiency of fluid dispensing systems in semiconductor processes.