Company Filing History:
Years Active: 1997-2000
Title: Innovations of Chung-Chyung Han
Introduction
Chung-Chyung Han is a prominent inventor based in San Jose, CA, known for his significant contributions to semiconductor technology. He holds a total of 7 patents, showcasing his expertise and innovative spirit in the field.
Latest Patents
Among his latest patents, one notable invention is the "CMOS structure having a gate without spacers." This CMOS structure features two adjacent transistors of opposite conductivity, each equipped with a gate positioned above their respective channel regions. Notably, spacers are absent from the gate of one of the transistors, and the structure is characterized by lightly doped regions. Another significant patent is for a "Mosfet with raised source and drain regions." This invention involves a semiconductor substrate with a surface and a field oxide region. A gate structure is placed above the surface, and a sidewall spacer is formed adjacent to the gate structure. The raised source and drain regions are fabricated without using photolithography, allowing for the easy production of high-density MOSFETs.
Career Highlights
Chung-Chyung Han is currently employed at Integrated Device Technology, Inc., where he continues to push the boundaries of semiconductor innovation. His work has been instrumental in advancing technologies that are crucial for modern electronic devices.
Collaborations
He has collaborated with notable coworkers, including Jeong Yeol Choi and Chung-Jen Chien, contributing to a dynamic and innovative work environment.
Conclusion
Chung-Chyung Han's contributions to the field of semiconductor technology through his patents and collaborations highlight his role as a leading inventor. His innovative work continues to impact the industry significantly.