The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 28, 2000
Filed:
Jun. 09, 1997
Jeong Yeol Choi, Palo Alto, CA (US);
Chung-Chyung Han, San Jose, CA (US);
Ken-Chuen Mui, San Jose, CA (US);
Integrated Device Technology, Inc., Santa Clara, CA (US);
Abstract
A semiconductor substrate having a surface, a planarized field oxide region at the surface and a gate structure overlying the surface are provided. A sidewall spacer is formed adjacent to the gate structure and a polysilicon layer is formed overlying the substrate, the polysilicon layer having a raised first portion overlying the gate structure. A masking layer is formed overlying the polysilicon layer and then blanket etched to expose the raised first portion of the polysilicon layer which is subsequently removed. Since the raised first portion of the polysilicon layer is removed without using photolithography, high density MOSFETs are readily fabricated.