Pingtung, Taiwan

Chung-Chin Huang


Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2015-2017

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2 patents (USPTO):Explore Patents

Title: Innovations of Chung-Chin Huang

Introduction

Chung-Chin Huang is a notable inventor based in Pingtung, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of 2 patents. His work focuses on the development of advanced metal oxide semiconductor structures.

Latest Patents

Huang's latest patents include a metal oxide semiconductor structure that features a substrate, a gate electrode, a gate insulation layer, an IGZO layer functioning as a channel, and both source and drain electrodes. Additionally, he has developed a production method for this semiconductor structure, which incorporates similar components and layers to enhance its functionality and efficiency.

Career Highlights

Chung-Chin Huang is currently employed at E Ink Holdings Inc., where he continues to innovate in the field of electronics. His expertise in semiconductor technology has positioned him as a key player in the industry, contributing to advancements that impact various applications.

Collaborations

Huang has collaborated with notable coworkers, including Chin-Wen Lin and Chuan-I Huang, to further enhance the research and development of semiconductor technologies.

Conclusion

Chung-Chin Huang's contributions to metal oxide semiconductor structures demonstrate his commitment to innovation in technology. His patents reflect a deep understanding of semiconductor design and production methods, solidifying his reputation as a leading inventor in his field.

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