Company Filing History:
Years Active: 2015-2017
Title: Innovations of Chung-Chin Huang
Introduction
Chung-Chin Huang is a notable inventor based in Pingtung, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of 2 patents. His work focuses on the development of advanced metal oxide semiconductor structures.
Latest Patents
Huang's latest patents include a metal oxide semiconductor structure that features a substrate, a gate electrode, a gate insulation layer, an IGZO layer functioning as a channel, and both source and drain electrodes. Additionally, he has developed a production method for this semiconductor structure, which incorporates similar components and layers to enhance its functionality and efficiency.
Career Highlights
Chung-Chin Huang is currently employed at E Ink Holdings Inc., where he continues to innovate in the field of electronics. His expertise in semiconductor technology has positioned him as a key player in the industry, contributing to advancements that impact various applications.
Collaborations
Huang has collaborated with notable coworkers, including Chin-Wen Lin and Chuan-I Huang, to further enhance the research and development of semiconductor technologies.
Conclusion
Chung-Chin Huang's contributions to metal oxide semiconductor structures demonstrate his commitment to innovation in technology. His patents reflect a deep understanding of semiconductor design and production methods, solidifying his reputation as a leading inventor in his field.