Chung-Chang Chang

Title: Innovations of Chung-Chang Chang

Introduction

Chung-Chang Chang is a notable inventor based in Hsinchu County, Taiwan. He has made significant contributions to the field of sensor technology. His innovative work has led to the development of a unique sensor design that enhances functionality and efficiency.

Latest Patents

Chung-Chang Chang holds a patent for a "Sensor with dam structure and method for manufacturing the same." This invention includes a first chip, a dam structure, and a cover. The first chip features a substrate, a sensing area, and a low-k material layer. The sensing area is located on the surface of the substrate, while the low-k material layer is integrated within the substrate. The dam structure is positioned on the first chip, covering the edge of the low-k material layer. The cover is placed on the dam structure, effectively shielding the sensing area. This patent represents a significant advancement in sensor technology, with 1 patent to his name.

Career Highlights

Chung-Chang Chang is associated with Powertech Technology Inc., a leading company in the semiconductor industry. His work at this organization has allowed him to push the boundaries of sensor technology and contribute to various innovative projects.

Collaborations

Chung-Chang Chang has collaborated with talented individuals such as Chang-Lun Lu and Ming-Hung Lin. These partnerships have fostered a creative environment that encourages the development of groundbreaking technologies.

Conclusion

Chung-Chang Chang's contributions to sensor technology exemplify the spirit of innovation. His patent and work at Powertech Technology Inc. highlight his commitment to advancing the field. His collaborations further enhance the potential for future breakthroughs in technology.