Vasteras, Sweden

Chun-Yuan Gu

This inventor holds 1 USPTO granted patent. Top assignees: Abb Research Ltd., Okmetic Ltd.. Active years: 2000.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Chun-Yuan Gu. Retrieved from https://idiyas.com/inventor/chun-yuan-gu-1eqtlg8p

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 6.0

ph-index = 1

Forward Citations = 23(Granted Patents)


Company Filing History:


Years Active: 2000

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1 patent (USPTO):Explore Patents

Title: The Innovative Contributions of Chun-Yuan Gu

Introduction

Chun-Yuan Gu is a notable inventor based in Vasteras, Sweden. He has made significant contributions to the field of materials science, particularly in the area of epitaxial growth techniques. His work has implications for various applications, including semiconductor manufacturing.

Latest Patents

Chun-Yuan Gu holds a patent for a "Device for epitaxially growing objects and method for such a growth." This innovative device is designed for the epitaxial growth of materials such as silicon carbide (SiC) using Chemical Vapor Deposition (CVD) techniques. The device features a first conduit that conducts a carrier gas to a substrate room and a second conduit that carries reactive gases, optimizing the growth process.

Career Highlights

Throughout his career, Chun-Yuan Gu has worked with prominent companies, including Abb Research Ltd. and Okmetic Ltd. His experience in these organizations has allowed him to refine his expertise in materials science and engineering.

Collaborations

Chun-Yuan Gu has collaborated with talented individuals in his field, including Alex Ellison and Olle Kordina. These partnerships have contributed to the advancement of his research and innovations.

Conclusion

Chun-Yuan Gu's contributions to the field of epitaxial growth and his innovative patent demonstrate his commitment to advancing technology in materials science. His work continues to influence the industry and inspire future innovations.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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