Tainan, Taiwan

Chun-ying Wu

This inventor holds 1 USPTO granted patent. Top assignee: National Cheng-Kung University. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Chun-ying Wu. Retrieved from https://idiyas.com/inventor/chun-ying-wu-fehmrvj0

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Innovations of Chun-ying Wu

Introduction

Chun-ying Wu is a notable inventor based in Tainan, Taiwan. He has made significant contributions to the field of optical systems, particularly with his innovative patent that enhances efficiency in imaging technologies. His work is recognized for its potential applications in various industries.

Latest Patents

Chun-ying Wu holds a patent titled "Cyclic exposure scanning system having distributed multi-lens and method thereof." This invention provides a cyclic exposure scanning system that includes a processor, a platform, an optical engine, a first optical imaging device, a second optical device, and a light guide structure. The system is designed to project first and second optical images, guiding them to their respective imaging devices. This method significantly increases efficiency and light source utilization.

Career Highlights

Chun-ying Wu is affiliated with National Cheng-Kung University, where he contributes to research and development in optical technologies. His academic background and innovative mindset have positioned him as a key figure in his field.

Collaborations

Chun-ying Wu has collaborated with notable colleagues, including Yung-Chun Lee and Ting-hsuan Miau. Their combined expertise enhances the research and development efforts within their projects.

Conclusion

Chun-ying Wu's contributions to optical systems through his innovative patent demonstrate his commitment to advancing technology. His work not only reflects his expertise but also has the potential to impact various applications in the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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