Changhua, Taiwan

Chun-Ying Lin

This inventor holds 1 USPTO granted patent. Top assignee: Ritek Corporation. Active years: 2005.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Chun-Ying Lin. Retrieved from https://idiyas.com/inventor/chun-ying-lin-pwj7a838

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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Average Co-Inventor Count = 3.0

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Company Filing History:


Years Active: 2005

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1 patent (USPTO):Explore Patents

Title: Innovations by Chun-Ying Lin

Introduction

Chun-Ying Lin is a notable inventor based in Changhua, Taiwan. He has made significant contributions to the field of optical disk technology. His innovative work focuses on enhancing the performance of recordable digital versatile disks (DVD-R).

Latest Patents

Chun-Ying Lin holds a patent for a method and structure aimed at intensifying track seeking signals from an optical disk. This invention specifically addresses the challenges associated with DVD-Rs. By incorporating an optical correction layer made from inorganic materials between the dye material layer and the reflection layer, track-seeking signals are intensified. This enhancement leads to improved recording quality for optical disks.

Career Highlights

Chun-Ying Lin is associated with Ritek Corporation, a leading company in the optical storage industry. His work at Ritek has allowed him to focus on advancing optical disk technologies. His innovative approach has contributed to the company's reputation for quality and reliability in optical media.

Collaborations

Chun-Ying Lin has collaborated with notable colleagues such as Shyh-yeu Wang and Biing-Hwang Lin. These collaborations have fostered a creative environment that encourages innovation and the development of new technologies.

Conclusion

Chun-Ying Lin's contributions to optical disk technology exemplify the impact of innovation in enhancing recording quality. His patent reflects a commitment to improving the functionality of optical media. Through his work at Ritek Corporation, he continues to influence the industry positively.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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