This inventor holds 1 USPTO granted patent. Top assignee: Other. Active years: 2020.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2020
Title: Innovations by Chun Ying Lee in Metal Polishing Technology
Introduction
Chun Ying Lee is an accomplished inventor based in Taipei, Taiwan. She has made significant contributions to the field of metal polishing and oxidation processes. Her innovative methods have the potential to enhance the quality and efficiency of metal workpieces.
Latest Patents
Chun Ying Lee holds a patent for a method of metal polishing and oxidation film process. This invention involves a systematic approach to polishing metallic workpieces using an electrolysis polishing liquid. The process includes several key steps: providing the metallic workpiece in the polishing liquid, controlling the liquid temperature, applying an operating voltage, and polishing the surface to form an oxidation layer. The thickness of this layer can be determined based on the operation time, which is related to the roughness and color of the workpiece. Notably, the metallic workpiece can be dyed during the polishing process without the need for additional dyes. This innovative method not only improves the polishing process but also introduces a system for alloy oxidation film processes.
Career Highlights
Chun Ying Lee has demonstrated her expertise through her patent, showcasing her ability to innovate in the field of metal treatment. Her work is recognized for its practical applications and potential impact on manufacturing processes.
Collaborations
Chun Ying Lee collaborates with talented individuals such as Bo Yan Su and Kun Cheng Peng. These partnerships enhance her research and development efforts, contributing to the advancement of her innovative methods.
Conclusion
Chun Ying Lee's contributions to metal polishing technology exemplify her innovative spirit and dedication to improving industrial processes. Her patent reflects a significant advancement in the field, showcasing her ability to merge technology with practical applications.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile