Chun-Yen Tai

Title: Innovations of Chun-Yen Tai in Semiconductor Manufacturing

Introduction

Chun-Yen Tai is a notable inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of semiconductor manufacturing, holding two patents that showcase his innovative methods. His work is instrumental in advancing technology in this critical industry.

Latest Patents

Chun-Yen Tai's latest patents include a method of manufacturing a semiconductor device that involves depositing a photoresist material over a substrate. The substrate is rotated to spread the photoresist material, and a gas is blown to the edge of the substrate during the rotation. The process concludes with stopping the rotation and the blowing of the gas. Another patent details a method where underlying structures comprising gate electrodes and source/drain epitaxial layers are formed. This method includes several steps, such as forming layers over the underlying structures, creating a hard mask layer, and patterning the hard mask layer using a first photo resist pattern.

Career Highlights

Chun-Yen Tai is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His expertise and innovative approaches have contributed to the company's reputation for excellence in manufacturing.

Collaborations

Chun-Yen Tai has collaborated with notable coworkers, including Yen-Hsin Liu and Ming-Jhih Kuo. Their teamwork has fostered an environment of innovation and progress within their projects.

Conclusion

Chun-Yen Tai's contributions to semiconductor manufacturing through his patents reflect his dedication to innovation in technology. His work continues to influence the industry and pave the way for future advancements.