This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Chunghwa Picture Tubes, Ltd.. Active years: 2010.
Company Filing History:
Years Active: 2010
Title: Innovations of Chun-Jen Ma in Thin Film Transistor Technology
Introduction
Chun-Jen Ma is a notable inventor based in Taichung, Taiwan. He has made significant contributions to the field of thin film transistors, which are essential components in various electronic devices. His innovative approach has led to advancements in manufacturing processes that enhance the performance of these transistors.
Latest Patents
Chun-Jen Ma holds a patent for a "Method of manufacturing thin film transistor." This method introduces a new etching process for island semiconductors. The etching process is controlled by the flow rate of etching gas and the regulation of etching power. During the etching of the island semiconductor, a portion of the gate insulation layer that is exposed is also etched. This results in a reduced thickness of the gate insulation layer over the storage capacitance electrode. Consequently, the distance between the pixel electrode and the storage capacitance electrode is decreased, which increases the storage capacitance of the pixel. Additionally, the width of the storage capacitance electrode is appropriately reduced, leading to an increased aperture ratio of the product.
Career Highlights
Chun-Jen Ma is associated with Chunghwa Picture Tubes, Ltd., where he applies his expertise in semiconductor technology. His work has been instrumental in improving the efficiency and effectiveness of thin film transistors in various applications.
Collaborations
Chun-Jen Ma has collaborated with talented individuals such as Ya-Ju Lu and Jun-Yao Huang. These collaborations have fostered a creative environment that encourages innovation and the development of new technologies.
Conclusion
Chun-Jen Ma's contributions to the field of thin film transistors exemplify the impact of innovative thinking in technology. His patented methods and collaborative efforts continue to influence advancements in electronic manufacturing processes.