Coquitlam, Canada

Chun Ho Sze

This inventor holds 2 USPTO granted patents. Top assignees: Novadaq Technologies Ulc, Other. Active years: 2017-2019.


% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 2

Forward Citations = 21(Granted Patents)


Company Filing History:


Years Active: 2017-2019

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2 patents (USPTO):Explore Patents

Title: Innovations by Inventor Chun Ho Sze

Introduction

Chun Ho Sze is a notable inventor based in Coquitlam, Canada. He has made significant contributions to the field of imaging technologies, particularly in biological materials. With a total of 2 patents, his work has advanced the understanding and application of fluorescence imaging.

Latest Patents

Chun Ho Sze's latest patents focus on the innovative methods for imaging a target fluorophore in biological materials in the presence of autofluorescence. These methods involve inducing both autofluorescence of the biological material and fluorescence of the fluorophore. The process includes acquiring images from both the autofluorescence and the fluorophore, as well as an image arising solely from the autofluorescence. By subtracting these two images, an image representing only the fluorophore is produced. The relative intensities of the excitation light used to induce autofluorescence and fluorescence are modulated prior to image acquisition, enhancing the clarity and accuracy of the results.

Career Highlights

Throughout his career, Chun Ho Sze has worked with various companies, including Novadaq Technologies. His expertise in imaging technologies has positioned him as a valuable asset in the field.

Collaborations

Chun Ho Sze has collaborated with notable individuals, including his coworker Eduardo Hiroyuki Moriyama. Their joint efforts have contributed to advancements in imaging techniques.

Conclusion

Chun Ho Sze's innovative work in fluorescence imaging has made a significant impact in the field of biological research. His patents reflect a commitment to enhancing imaging technologies, paving the way for future advancements.

Profile summary based on public USPTO records.
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