Daejeon, South Korea

Chun Ho Kim

This inventor holds 3 USPTO granted patents. Top assignees: Sk Innovation., Ltd., Sk Innovation Co., Ltd.. Active years: 2025-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Chun Ho Kim. Retrieved from https://idiyas.com/inventor/chun-ho-kim-cv156oye

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 33.3

Average Co-Inventor Count = 2.0

ph-index = 1


Company Filing History:


Years Active: 2025-2026

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3 patents (USPTO):Explore Patents

Title: Innovations of Chun Ho Kim

Introduction

Chun Ho Kim is a notable inventor based in Daejeon, South Korea. He has made significant contributions to the field of optical technology through his innovative patents. His work focuses on enhancing the durability and optical properties of multilayer structures.

Latest Patents

Chun Ho Kim holds a patent for an "Optical multilayer structure and method for manufacturing the same." This invention includes a shatterproof layer made from a polyimide resin that incorporates a siloxane structure, along with an adhesion promoting layer. The unique feature of this optical multilayer structure is that the adhesion promoting layer and the shatterproof layer are chemically bonded, resulting in high interlayer adhesiveness and excellent durability. Additionally, this structure exhibits remarkable heat resistance, reducing curling and minimizing substrate bending. It also boasts high surface hardness and low haze, ensuring superior optical properties.

Career Highlights

Chun Ho Kim is associated with Sk Innovation Co., Ltd., where he continues to develop innovative solutions in optical technology. His work has garnered attention for its practical applications and advancements in material science.

Collaborations

Chun Ho Kim collaborates with Cheol Min Yun, contributing to the development of cutting-edge technologies in their field.

Conclusion

Chun Ho Kim's contributions to optical multilayer structures demonstrate his commitment to innovation and excellence in technology. His work not only enhances the durability and performance of optical materials but also paves the way for future advancements in the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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